Industrial position in process engineering and/or research and development of semiconductor materials utilizing characterization tools including scanning probe microscopy.

Ph.D. Materials Science and Engineering (projected June 2002).
Dissertation topic: Semiconductor device characterization using cross-sectional scanning probe microscopy.
M.S., Materials Science (1997).
University of California San Diego, La Jolla, CA.

B.S., Materials Engineering (cum laude) (1996).
California Polytechnic State University, San Luis Obispo, CA.

Graduate Student Researcher, Nanoscale Characterization and Devices Laboratory.
UC San Diego, La Jolla, CA. (1996-present).
Advisor: Dr. Edward T. Yu

• Direct cross-sectional SCM imaging of deep-submicron Si transistor structures including super-halo implants. Direct measurement of apparent channel length in these devices which have a complex 2-D channel doping profile.
• Investigating focused ion beam (FIB) implanted Si using cross-sectional scanning capacitance microscopy, including dose-rate and activation annealing effects on resulting 2-d electronic structure.
• Performed cross-sectional electrical measurements of AlGaAs/GaAs HBTs using scanning probe techniques.
• Demonstrated nanoscale layer thickness metrology and dopant profiling.

Student Researcher, Rockwell International Science Center Sponsored Senior Projects Group.
Cal. Poly. State University, San Luis Obispo, CA.
Advisor: Dr. Blair London.
Senior Project: "Hot-workability study of fine-grained iron-nickel based superalloys."

• High temperature and high strain-rate deformation processing, including metallographic, SEM, and EDS analysis and interpretation of the resulting microstructures.
• Culminated in presentation for Rockwell International Science Center, Thousand Oaks, CA. May, 1996.

Engineering Technical Assistant
Solectron Corporation, Milpitas, CA.

• Produced maintenance procedures and developed statistical process control (SPC) for printed circuit board wave soldering and processing equipment.
• Experience with surface mount technology and wave solder processing in manufacturing environment.

Laboratory: Cross-sectional AFM surface and electrical measurements, AFM sample preparation, Optical and electron microscopy, Electron beam lithography, Microelectronic device processing, Thin film deposition of metals using thermal and electron beam evaporation, Rapid thermal processing and diffusion, Nanoscale delineation of electrical p-n junction, X-ray diffraction.

Computer:Digital Instruments Nanoscope® software,1-d Poisson/Schrödinger solver, Silvaco 2-d simulation tools (ATHENA and ATLAS), SRIM, MatLab, Mathematica, Origin, Microsoft Office, Fortran and Pascal software language, data structure and algorithm, HTML,TeX/LaTeX, Win98/NT, Unix.

• "Direct measurement and characterization of n+ super-halo implants in a 120 nm gate-length Si metal-oxide-semiconductor field-effect transistor using cross-sectional scanning capacitance microscopy,"
  submitted to Appl. Phys. Lett., (2002).
  
  
• "Characterization of AlxGa1-xAs/GaAs heterojunction bipolar transistor structures using cross-sectional scanning force microscopy,"
  J. Appl. Phys., 87(4), 1937 (2000).
  

  Abstract (HTML)

  PDF (182 kB)

  
  
• "Structural and electronic properties of AlxGa1-xAs/GaAs heterojunction bipolar transistors characterized using cross-sectional scanning force microscopy,"
  42nd Electronic Materials Conference Abstracts, University of Denver, Denver, CO. June 23, 2000.
  J. Elec. Mater. 29(7), 32 (2000),

  Abstract (HTML)

  Presentation PDF (307 kB)

  
  
• "Scanning capacitance microscopy study of focused ion beam implanted silicon,"
  Arizona State University Focused Ion Beam Facility Research Review, Tempe, AZ. June 16, 2000. Invited.
  
  
• "Cross-sectional Kelvin probe force microscopy of epitaxial layers for heterojunction bipolar transistors,"
  40th Electronic Materials Conference Abstracts, University of Virginia, Charlottesville, VA. June 24, 1998.
  J. Elec. Mater. 27(7), 6 (1998),

  Abstract (HTML)

  Presentation PDF (498 kB)

• Collaboration with Dynamics Research Corporation, San Diego, CA. (1999-present)
• Vice-President, UCSD Materials Research Society Student Chapter (1999-2000).
• Poster Presentations, UCSD School of Engineering Annual Research Review (1997-present)
• Abe Hurlich Award, San Diego chapter of ASM International (1997).

Prof. Edward T. Yu
Department of Electrical and Computer Engineering
University of California, San Diego
9500 Gilman Drive, Mail Code 0407
La Jolla, CA 92093-0407
(858) 534-6619
ety@ece.ucsd.edu

Prof. M. Lea Rudee
Department of Electrical and Computer Engineering
University of California, San Diego
9500 Gilman Drive, Mail Code 0407
La Jolla, CA 92093-0407
(858) 534-8998
rudee@ucsd.edu

Prof. Blair London
Materials Engineering Department
California Polytechnic State University
1 Grand Avenue
San Luis Obispo, CA 93407
(805) 756-2536
blondon@calpoly.edu